BIU Enhances 2D Material Capabilities with New 11'' CVD System for TMD Growth

BIU has recently integrated a new 11-inch Chemical Vapor Deposition (CVD) system, specifically tailored for the growth of high-quality transition metal dichalcogenide (TMD) layers such as MoS₂, WS₂, and WSe₂. This advanced system is designed for wafer scalable deposition, currently running 4” wafers (in the picture). The produced TMD layers will serve as donors in the LIFT (Laser-Induced Forward Transfer) process within the L2D2 project, where 2D materials will be transferred from substrate wafers to target acceptors. This CVD system significantly enhances BIU’s ability to support the integration of 2D materials into advanced optoelectronic and quantum devices.